A Close Look at Class 10k and Class 100k Cleanrooms

Introduction In the fluorine material lining sector, production environment cleanliness directly impacts product quality. RANA (Jiangsu Ruineng Fluorine Material Technology) has invested heavily to build China's only 9,000 ㎡ dust-free clean PTFE plate lining facility, comprising 1,800 ㎡ Class 10k and 7,200 ㎡ Class 100k clean workshops, forming a solid hardware foundation for high-end lining product manufacturing.

Class 10k Clean Workshop (1,800 ㎡): For PPB-Grade High-Purity Production

With a cleanliness level of ISO Class 6 (max 10,000 particles ≥0.5μm per cubic meter), this workshop meets the standards applied in semiconductor core processes and biomedical sterile production. It is dedicated to manufacturing PPB-PPT grade high-purity lining products, including 12-inch wafer fab PFA lining storage tanks, wet electronic chemical ultra-high-purity equipment, and SEMI C12 (Grade 4) compliant products. These products require metal impurities ≤0.1ppb and particle control ≤0.2 particles/μL, which can only be achieved in a Class 10k environment.
RANA enforces strict management protocols for this workshop: personnel must wear full dust-free protective gear and pass a 30-second air shower before entry; all incoming materials undergo thorough cleaning; environmental parameters including temperature, humidity, pressure difference and cleanliness are monitored in real time; and a three-stage cleaning process (electronic-grade IPA wiping, high-pressure pure water rinsing, ultra-pure water circulation cleaning) is implemented.

Class 100k Clean Workshop (7,200 ㎡): For Medium-High Purity Production

With a cleanliness level of ISO Class 7 (max 100,000 particles ≥0.5μm per cubic meter), this workshop meets the standards for semiconductor packaging and LCD panel manufacturing. It produces PPM-PPB grade lining products for 8-inch and smaller wafer fabs, mid-end wet electronic chemical applications, and basic chemical strong corrosion process equipment, which require metal impurity levels between ≤1ppm and ≤1ppb.
The 7,200 ㎡ area provides significant capacity advantages: it supports simultaneous production of multiple projects to avoid delivery delays, can accommodate large bulk orders from major wafer fabs and chemical enterprises, and allows flexible production scheduling based on order priority.

9,000 ㎡ Total Area: Unique in China, Industry Leading

RANA's 9,000 ㎡ clean facility is the only one of its kind in China's fluorine material lining industry. Most domestic competitors have no clean workshops at all, while the few with Class 1k or Class 10k facilities typically only have areas of a few hundred square meters, far smaller than RANA's.
This hardware advantage is a key factor for high-end customer selection: IC semiconductor clients rely on Class 10k production to meet 12-inch wafer fab ultra-high purity requirements; wet electronic chemical customers benefit from RANA's ability to supply both PPB and PPM grade products covering the entire industry chain; and basic chemical clients appreciate the reliable delivery and reduced inventory pressure enabled by the large production capacity.

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