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PTFE Lined Storage Tank for Tetramethylammonium Hydroxide

RANA’s PTFE lined ammonium tetramethyl hydroxide storage tank is lined with PTFE, designed to meet the strong alkalinity and high purity requirements of electronic-grade trimethylammonium hydroxide (TMAH). TMAH is commonly used in the cleaning of semiconductor wafers and the development of photoresists, and it is highly sensitive to impurities such as metal ions. The chemical inertness of PTFE prevents the tank material from leaching out contaminants, ensuring that the stored TMAH maintains its purity.

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Product Introduction

RANA's PTFE lined ammonium tetramethyl hydroxide storage tank is lined with PTFE, designed to meet the strong alkalinity and high purity requirements of electronic-grade trimethylammonium hydroxide (TMAH). TMAH is commonly used in the cleaning of semiconductor wafers and the development of photoresists, and it is highly sensitive to impurities such as metal ions. The chemical inertness of PTFE prevents the tank material from leaching out contaminants, ensuring that the stored TMAH maintains its purity. Additionally, the low permeability of PTFE prevents moisture or CO₂ from entering, thus avoiding a decrease in TMAH concentration due to moisture absorption or carbonation.

The storage tank is primarily used in the production of electronic chemicals and semiconductor manufacturing. Its inner wall features a smooth, seamless design, which reduces the risk of material residue and facilitates the replacement of TMAH solutions of different batches or specifications. Additionally, the tank is constructed with food-grade sealing materials, meeting the stringent requirements for ultra-clean storage environments in the semiconductor industry. This equipment is essential for ensuring the precision of core board manufacturing processes.